NPTEL Sensors and Actuators Week 10 Assignment Answers 2025

NPTEL Sensors and Actuators Week 10 Assignment Answers 2025

1. Which amongst the following is used as a photoresist stripper?

  • Ethanol
  • BHF
  • Isopropyl alcohol
  • None of the above
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2. HMI was introduced as the control for the Thermal/E-beam evaporator system. What does HMI mean?

  • High Maintenance Interface
  • Human Machine Interface
  • Heavy Machine Interface
Answer :- 

3. Which properties of breast tissues have been characterized using the fabricated piezoresistive microcantilever?

  • Electrical
  • Mechanical
  • Both Electrical and Mechanical
Answer :- 

4. Complete the following statement:
The microsensor with __ is used for characterizing the electrical properties of the breast tissues using impedance measurements.

  • Microheater
  • Cantilever
  • SU-8 well
  • Interdigitated electrodes
Answer :- 

5. Which material is used as base material to provide better adhesion to gold film during the fabrication of interdigitated electrodes?

  • Nickel
  • Tungsten
  • Silver
  • Chromium
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6. Evaluate whether the below statement is true or false:
“Breast cancer is the second largest cause of cancer-related female deaths in the world accounting for 12 % amongst all cancers.”

  • True
  • False
Answer :- 

7. During photolithography, soft bake and hard bake are performed at which temperatures in general?

  • 90°C and 110°C
  • 110°C and 90°C
  • 120°C and 90°C
  • 90°C and 120°C
Answer :- 

8. Evaluate whether the below statement is true or false:
“Turbo molecular pump is used to provide the initial vacuum in the physical deposition system demonstrated in the lecture video.”

  • True
  • False
Answer :- 

9. What is the reason for using PECVD for depositing silicon dioxide during the fabrication of Piezoresistive microcantilever?

  • Easy process
  • Less time-consuming process
  • Low temperature process
Answer :- 

10. For the interdigitated electrode-based electrical characterization of breast cancer tissues, SU8 photoresist was used in the process flow. Which of the following holds TRUE for SU-8?

  • SU-8 is a positive photoresist.
  • SU-8 is a negative photoresist.
  • SU-8 is used for photoresist adhesion to the substrate.
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